Characterization of Germanium Implanted Si_1-xGe_x Layer

Authors

Ashawant Gupta
Carmen Cook
Len Toyoshiba
Jianmin Qiao
Cary Y. Yang, Santa Clara UniversityFollow
Ken-Ichi Shoji
Akira Fukami
Takashi Tokuyama

Document Type

Article

Publication Date

1-1993

Publisher

Springer-Verlag

Recommended Citation

A. Gupta, C. Cook, L. Toyoshiba, J. Qiao, and C.Y. Yang, K. Shoji, A. Fukami, T. Nagano, and T. Tokuyama, “Characterization of Germanium Implanted Si_1-xGe_x Layer,” Journal of Electronic Materials 22, 125-128 (1993).