Structural Characterization of Rapid Thermally Oxidized Silicon-Germanium-Carbon Alloy Films

Authors

W. K. Choi
L. K. Bera
J. H. Chen
W. Feng
K. L. Pey
Hans Yoong
J. Mi
Fan Zhang
Cary Y. Yang, Santa Clara UniversityFollow

Document Type

Article

Publication Date

6-2000

Publisher

Elsevier B. V.

Abstract

The properties of as-prepared and rapidly thermally oxidized Si_1−x−yGe_xC_y alloy films have been examined using infrared, X-ray diffraction, and Raman techniques. The structural properties of the oxidized Si_1−x−yGe_xC_y film depend on the type of strain of the as-prepared film. For compressive or fully compensated films, the oxidation process drastically reduces the carbon content such that the oxidized film compositions resemble that of Si_1−xGex films. For tensile films, two broad layers co-exist in the oxidized films, one with a carbon content higher and the other lower than that required for full strain compensation.

Recommended Citation

W.K. Choi, L.K. Bera, J.H. Chen, W. Feng, K.L. Pey, H. Yoong, J. Mi, F. Zhang, and C.Y. Yang, “Structural Characterization of Rapid Thermally Oxidized Silicon-Germanium-Carbon Alloy Films,” Materials Science and Engineering B75, 184-186 (2000).