Title
Resistance Determination for Sub-100 nm Carbon Nanotube Vias
Document Type
Article
Publication Date
1-2015
Publisher
IEEE
Abstract
We report resistance results from carbon nanotube (CNT) vias of widths from 150 to 60 nm for potential application in integrated circuits technology. Selective CNT growth inside the vias with an areal density of 2×1011 /cm2 is achieved with a statistical average resistance of 1.7 kΩ with standard deviation between 420 Ω and 7.1 kΩ, and lowest resistance of 150 Ω for 60 nm vias, the lowest reported value for sub-100 nm-CNT vias. Statistical analysis yields a best-case projected value of 295 Ω for a 30 nm via, within one order of magnitude of its copper and tungsten counterparts.
Recommended Citation
C. Zhou, A.A. Vyas, P. Wilhite, P. Wang, M. Chan, and C.Y. Yang, “Resistance Determination for Sub-100 nm Carbon Nanotube Vias,” IEEE Electron Device Letters 36, 71-73 (2015).
