Contact engineering for nanocarbon interconnects

Authors

Yusuke Abe
Anshul A. Vyas, Santa Clara UniversityFollow
Richard Senegor
Patrick Wilhite
Cary Y. Yang, Santa Clara UniversityFollow

Document Type

Conference Proceeding

Publication Date

2-21-2016

Publisher

IEEE

Abstract

Electron-beam-induced deposited-tungsten (EBID-W) technique is used to fabricate contacts for carbon nanofiber (CNF) horizontal interconnect and carbon nanotube (CNT) vertical vias to improve the contact resistances at the nanocarbon-metal electrodes.

Comments

IEEE 15th International Conference on Nanotechnology (IEEE-NANO)
27-30 July 2015
Rome, Italy

Recommended Citation

Abe, Y., Vyas, A., Senegor, R., Wilhite, P., & Yang, C. Y. (2015). Contact engineering for nanocarbon interconnects. 2015 IEEE 15th International Conference on Nanotechnology (IEEE-NANO), 1194–1196. https://doi.org/10.1109/NANO.2015.7388840